Triode/MOS tube/transistor/module
WILLSEMI (Will)
Fabricantes
P channel, -20V-2.4A
Descripción
TOSHIBA (Toshiba)
Fabricantes
HUASHUO (Huashuo)
Fabricantes
TECH PUBLIC (Taizhou)
Fabricantes
GOFORD (valley peak)
Fabricantes
XCH (Xu Changhui)
Fabricantes
onsemi (Ansemi)
Fabricantes
This dual N-channel logic level enhancement mode field effect transistor is produced using a high cell density DMOS proprietary technology. This very high-density process is ideal for minimizing on-resistance. This device is designed to replace bipolar digital transistors and small signal MOSFETs in low voltage applications. Because no bias resistor is required, these dual digital FETs can replace several digital transistors with various bias resistor values.
Descripción
onsemi (Ansemi)
Fabricantes
PJSEMI (flat crystal micro)
Fabricantes
Transistor type: NPN, collector-emitter breakdown voltage (Vceo): 50V collector current (Ic): 100mA R1=4.7K R2=47K
Descripción
DIODES (US and Taiwan)
Fabricantes
SPTECH (Shenzhen Quality Super)
Fabricantes
APEC (Fuding)
Fabricantes
minos (Minos)
Fabricantes
SPTECH (Shenzhen Quality Super)
Fabricantes
Infineon (Infineon)
Fabricantes
VBsemi (Wei Bi)
Fabricantes
onsemi (Ansemi)
Fabricantes
This P-channel 2.5V specified MOSFET is a robust gate version of the advanced PowerTrench process. It is optimized for power management applications with wide gate drive voltage ratings (2.5V – 12V).
Descripción